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US20200348468 - OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS

Office

United States of America
Application Number16932970
Application Date20.07.2020
Publication Number20200348468
Publication Date05.11.2020
Publication KindA1
ApplicantsPOET Technologies, Inc.
InventorsWilliam Ring
Miroslaw Florjanczyk
Suresh Venkatesan

Title

(EN) OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS

Abstract

(EN)

A method for depositing silicon oxynitride film structures is provided that is used to form planar waveguides. These film structures are deposited on substrates and the combination of the substrate and the planar waveguide is used in the formation of optical interposers and subassemblies. The silicon oxynitride film structures are deposited using low thermal budget processes and hydrogen-free oxygen and hydrogen-free nitrogen precursors to produce planar waveguides that exhibit low losses for optical signals transmitted through the waveguide of 1 dB/cm or less. The silicon oxynitride film structures and substrate exhibit low stress levels of less than 20 MPa.

 

https://patentscope.wipo.int/search/en/detail.jsf?docId=US310544314&tab=NATIONALBIBLIO&_cid=P10-KHCY0N-74476-1


https://patentscope.wipo.int/search/en/detail.jsf?docId=US310544314&tab=PCTDESCRIPTION&_cid=P10-KHCY0N-74476-1

 

This is a continuation of previous application: https://uspto.report/patent/app/20190271810

 

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