Office: United States of America
Application Number: 16258292 Application Date: 25.01.2019
Publication Number: 20190271810 Publication Date: 05.09.2019
Applicants: POET Technologies, Inc.
Inventors: William Ring
Miroslaw Florjanczyk
Suresh Venkatesan
Title: (EN) OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
Abstract:
A method for depositing silicon oxynitride film structures is provided that is used to form planar waveguides. These film structures are deposited on substrates and the combination of the substrate and the planar waveguide is used in the formation of optical interposers and subassemblies. The silicon oxynitride film structures are deposited using low thermal budget processes and hydrogen-free oxygen and hydrogen-free nitrogen precursors to produce planar waveguides that exhibit low losses for optical signals transmitted through the waveguide of 1 dB/cm or less. The silicon oxynitride film structures and substrate exhibit low stress levels of less than 20 MPa.
https://patentscope.wipo.int/search/en/detail.jsf?docId=US251288480&tab=NATIONALBIBLIO&_cid=P12-K0DBXI-59283-1
