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Thyristor-based optical XOR circuit

An optical XOR circuit that includes a thyristor and control circuitry operably coupled to terminals of the thyristor. The control circuitry is configured to control switching operation of the thyristor in response to the ON/OFF states of two digital optical signal inputs such that the thyristor produces a digital signal output that is the XOR function of the two digital optical signal inputs.

http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=%22opel+solar%22&OS=%22opel+solar%22&RS=%22opel+solar%22

Thyristor-based optical flip-flop

An optical flip-flop circuit that includes an optical thyristor configured to receive a digital optical signal input and produce a digital signal output based on the ON/OFF state of the digital optical signal input. The optical flip-flop circuit further includes control circuitry operably coupled to the terminals of the optical thyristor. The control circuitry is configured to control switching operation of the optical thyristor in response to the level of a digital electrical signal input.

http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=2&f=G&l=50&co1=AND&d=PTXT&s1=%22opel+solar%22&OS=%22opel+solar%22&RS=%22opel+solar%22

Semiconductor device for optoelectronic integrated circuits

A semiconductor device includes a series of layers formed on a substrate, including a first plurality of n-type layers, a second plurality of layers that form a p-type modulation doped quantum well structure (MDQWS), a third plurality of layers disposed between the p-type MDQWS and a fourth plurality of layers that form an n-type MDQWS, and a fifth plurality of p-type layers. The first plurality of layers includes a first etch stop layer of n-type formed on an n-type contact layer. The third plurality of layers includes a second etch stop layer formed above the p-type MDQWS and a third etch stop layer formed above and offset from the second etch stop layer. The fifth plurality of layers includes a fourth etch stop layer of p-type formed above the n-type MDQWS and a fifth etch stop layer of p-type doping formed above and offset from the fourth etch stop layer.

http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=3&f=G&l=50&co1=AND&d=PTXT&s1=%22opel+solar%22&OS=%22opel+solar%22&RS=%22opel+solar%22