Aiming to become the global leader in chip-scale photonic solutions by deploying Optical Interposer technology to enable the seamless integration of electronics and photonics for a broad range of vertical market applications
Message: E-Beam writing tools
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Here is a small article, that stated the importance of high-quality E-Beam writing tools.(e-beam lithography).
Note: it's about gas not GaAs.
''Having developed a structure suitable for scaling POET transistors to the 100nm scale, POET has actively engaged a third party foundry to replicate the POET results with greater precision and larger scale using advanced ebeam writing tools. Definition and repeatability of 100-nm has been difficult in the POET labs due to the limitations of available lithography tools and other equipment.''
Dr. Geoff Taylor, Chief Scientist and Board member noted: “... With the collaboration of our “3rdparty foundry”, we now have access to state of the art equipment highlighted by a state of the art ebeam writing tool. link
''Lithography is a key enabling process with very demanding requirements. Shrinking feature sizes will raise the bar even further. These increasing requirements on the process side will lead to increasing quality requirements for materials. This article provides an overview of existing gas applications in lithography and implications for the future.
Photolithography is a key enabling and very critical process during semiconductor chip manufacturing. It always occurs at the beginning, and any defect occurring during the lithography process impacts the quality of subsequent process steps.
Smaller feature sizes require a better optical resolution. As the resolution depends on the wavelength of the light, illuminating systems with increasingly smaller wavelengths had to be developed. The current lowest available wavelengths for high-volume manufacturing are193nm and 248nm and are used at the most critical layers.
Excimer lasers
The light sources used to produce the desired wavelengths are excimer gas lasers and are fed with gas mixtures containing halogens and noble gases. Krypton-Fluorine excimer lasers emit light with 248nm, while Argon-Fluorine lasers generate photons at 193nm. Both belong to the Deep Ultra- violet part of the spectrum and are therefore called DUV lasers (in contrast to EUV, which is Extreme Ultraviolet light).
High-precision starting materials
As the requirements on the precision of the lithography process are getting higher, equally precise quality control of the laser gas source material is mandatory.
Meeting the stringent requirements for mixture accuracy and gas purity are crucial for a high- quality light generation process. Gas contaminations as well as non-precise gas mixtures affect critical laser parameter like power output, target wavelengths, and lifetime.'' link
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